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Maskless Aligner Systems (two half days) 10 - 11 May 2021
Nordic Nanolab Network Webinar 10 - 11 May 2021

Maskless Aligner Systems (MLA) - first half day 09:00 - 12:00

MONDAY 10 MAY 2021: 09:00 – 10:00: BASIC OPERATION OF MLA TOOLS
Chair Leif S. Johanse DTU Nanolab. Presenter: Jens Hemmingsen DTU Nanolab
o Principle of operation
o From design to pattern
o Alignment modes
10:00 – 10:30 DISCUSSION
10:30 – 11:30: ADVANCED FEATURES AND POSSIBILITIES OF MLA TOOLS
Chair Leif S. Johansen DTU Nanolab. Presenter: Jens Hemmingsen DTU Nanolab
o Advantages/limitations: Conversion PC, write modes, high aspect ratio (add-on features)
o Tradeoffs during specification and purchasing
o Optical proximity correction (OPC) using Beamer.
11:30 – 12:00 DISCUSSION

Maskless Aligner Systems (MLA) - second half day 09:00 - 12:00

TUESDAY 11 MAY 2021: 09:00 – 10:00:
GREY SCALE LITHOGRAPHY
Chair Peter Köllensperger NorFab NTNU. Presenter Jens Høvik, NorFab NTNU
o Fundamental grey scale lithography
o “Mask” preparation
o Grey scale lithography on MLA 100 and 150
o Post processing: reflow etc.
10:00 – 10:30 DISCUSSION
10:30 – 11:30: BEYOND MLA
Chair, Ivan Maximov Myfab Lund
o Block copolymer, BCP, Presenter Ivan Maximov Myfab Lund
o Displacement Talbot Lithography, DTL. Presenter Sarah McKibbin, Myfab Lund
o Adhesion lithography. Presenter Sihai Luo, NorFab NTNU
o Cross exposure with dipole illumination using DUV stepper. Presenter Matthias Keil, DTU Nanolab
11:30 – 12:00 DISCUSSION
May 10, 2021 09:00 AM
May 11, 2021 09:00 AM
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